GAS BOX Multi-Gas Panel
Category:
Application areas: A universal subsystem for semiconductor dry-process equipment, primarily used in CVD, PECVD, MOCVD, ICP, ALD, and other such systems.
Process Application: MFC for precise flow control, pressure regulator for pressure control, and terminal filtration via a filter.
Customer Type: Semiconductor chip manufacturing, flat-panel display industry, solar cells, electronic component manufacturing, and other industries
|
Parameter Name |
Detailed Specifications |
|
Gas mixing type: |
Tetraatomic gas or polyatomic gas |
|
Panel dimensions: |
1/4", 1/2" |
|
Media Name: |
SiH4, NH3, N2O, H2, etc. |
|
Basic functions: |
Automatic purging, automatic vacuuming, automatic switching, automatic shutdown, and touch-screen operation. |
|
General optional features: |
Customized cabinet panel based on customer requirements |
|
Media-specific optional features: |
Pan heating |
GAS BOX Multi-Gas Panel
Category:
- Product Description
-
Application areas: A universal subsystem for semiconductor dry-process equipment, primarily used in CVD, PECVD, MOCVD, ICP, ALD, and other such systems.
Process Application: MFC for precise flow control, pressure regulator for pressure control, and terminal filtration via a filter.
Customer Type: Semiconductor chip manufacturing, flat-panel display industry, solar cells, electronic component manufacturing, and other industries
Parameter Name
Detailed Specifications
Gas mixing type:
Tetraatomic gas or polyatomic gas
Panel dimensions:
1/4", 1/2"
Media Name:
SiH4, NH3, N2O, H2, etc.
Basic functions:
Automatic purging, automatic vacuuming, automatic switching, automatic shutdown, and touch-screen operation.
General optional features:
Customized cabinet panel based on customer requirements
Media-specific optional features:
Pan heating
Related Products
BSGS High-Flow Specialty Gas Delivery Equipment
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